GENEVA, Aug. 11 -- DENKA COMPANY LIMITED (1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo1038338), デンカ株式会社 (東京都中央区日本橋室町二丁目１番１号) filed a patent application (PCT/JP2025/002478) for "CHLOROPRENE-BASED POLYMER, CHLOROPRENE-BASED POLYMER LATEX, CHLOROPRENE-BASED POLYMER LATEX COMPOSITION, DIP-MOLDED ARTICLE, RUBBER COMPOSITION, AND MOLDED ARTICLE" on Jan 27, 2025. With publication no. WO/2025/164576, the details related to the patent application was published on Aug 07, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC...