GENEVA, Jan. 13 -- DAWON POWERTRON CO., LTD. (485 Sihwahosu-roDanwon-gu, Ansan-siGyeonggi-do 15655), 주식회사 다원파워트론 (경기도안산시 단원구시화호수로 485) filed a patent application (PCT/KR2024/009404) for "APPARATUS AND METHOD FOR GENERATING NON-SINUSOIDAL HIGH VOLTAGE PULSE IN SEMICONDUCTOR MANUFACTURING FACILITY USING PLASMA" on Jul 03, 2024. With publication no. WO/2026/010003, the details related to the patent application was published on Jan 08, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Int...