INTERNATIONAL PATENT: DAICEL CORPORATION, 株式会社ダイセル FILES APPLICATION FOR "INJECTOR, METHOD FOR FORMING VOID USING SAID INJECTOR AND METHOD FOR REDUCING INTERSTITIAL LIQUID ACCUMULATED IN OBJECT"

GENEVA, Feb. 4 -- DAICEL CORPORATION (3-1, Ofuka-cho, Kita-ku, Osaka-shi, Osaka5300011), 株式会社ダイセル (大阪府大阪市北区大深町３番１号) filed a patent application (PCT/JP2024/024991) for "INJECTOR, METHOD FOR FORMING VOID USING SAID INJECTOR, AND METHOD FOR REDUCING INTERSTITIAL LIQUID ACCUMULATED IN OBJECT" on Jul 10, 2024. With publication no. WO/2025/023025, the details related to the patent application was published on Jan 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organizat...