GENEVA, May 19 -- DAI NIPPON PRINTING CO., LTD. (1-1, Ichigaya-kaga-cho 1-chome, Shinjuku-ku, Tokyo1628001), 大日本印刷株式会社 (東京都新宿区市谷加賀町一丁目1番1号) filed a patent application (PCT/JP2024/039547) for "MASK AND METHOD FOR PRODUCING MASK" on Nov 07, 2024. With publication no. WO/2025/100465, the details related to the patent application was published on May 15, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): HASHIMOT...