INTERNATIONAL PATENT: D2S, INC. FILES APPLICATION FOR "MASK IMAGE OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS"

GENEVA, March 4 -- D2S, INC. (4040 Moorpark Ave., Suite 250San Jose, CA 95117) filed a patent application (PCT/US2024/043770) for "MASK IMAGE OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS" on Aug 23, 2024. With publication no. WO/2025/043234, the details related to the patent application was published on Feb 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): ORIORDAN, Donald (4040 Moorpark Ave., Suite 250San Jose, CA 95117), FUJIMURA, Akira (4040 Moorpark Ave., Suite 250San Jose, CA 95117)

Abstract: Some embodiments provide a method for optimizing a mask layout for producin...