INTERNATIONAL PATENT: CYMER, LLC FILES APPLICATION FOR "METHOD AND SYSTEM FOR WAVELENGTH MEASUREMENT FOR A LITHOGRAPHIC APPARATUS OR AN INSPECTION APPARATUS"

GENEVA, Sept. 16 -- CYMER, LLC (17075 Thornmint CourtSan Diego, California 92127) filed a patent application (PCT/IB2025/051193) for "METHOD AND SYSTEM FOR WAVELENGTH MEASUREMENT FOR A LITHOGRAPHIC APPARATUS OR AN INSPECTION APPARATUS" on Feb 04, 2025. With publication no. WO/2025/186638, the details related to the patent application was published on Sep 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): ZHAO, Yingbo (17075 Thornmint CourtSan Diego, California 92127), DUFFEY, Thomas, Patrick (17075 Thornmint CourtSan Diego, California 92127)

Abstract: A lithographic apparatus includes an...