INTERNATIONAL PATENT: CVD EQUIPMENT CORPORATION FILES APPLICATION FOR "UNIFORM SILICON CARBIDE EPITAXIAL LAYER DEPOSITION SYSTEM UTILIZING FLUID PREHEATING"

GENEVA, April 30 -- CVD EQUIPMENT CORPORATION (355 South Technology DriveCentral Islip, New York 11722) filed a patent application (PCT/US2024/050647) for "UNIFORM SILICON CARBIDE EPITAXIAL LAYER DEPOSITION SYSTEM UTILIZING FLUID PREHEATING" on Oct 10, 2024. With publication no. WO/2025/085306, the details related to the patent application was published on Apr 24, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WRIGHT, Samuel J. (100 N Howells Point RoadBellport, New York 11713), SHATALOV, Maxim S. (94 Chestnut StreetMt. Sinai, New York 11766), MORAITIS, Christopher (100 Middleton Road #44Bo...