INTERNATIONAL PATENT: CSMC TECHNOLOGIES FAB2 CO., LTD., 无锡华润上华科技有限公司 FILES APPLICATION FOR "DOUBLE-LAYER COMPONENT HAVING ISOLATION STRUCTURE AND SEMICONDUCTOR DEVICE"

GENEVA, Sept. 8 -- CSMC TECHNOLOGIES FAB2 CO., LTD. (No. 8 XinzhouRoad, Wuxi New DistrictWuxi, Jiangsu 214028), 无锡华润上华科技有限公司 (中国江苏省无锡市无锡新区新洲路8号) filed a patent application (PCT/CN2024/128328) for "DOUBLE-LAYER COMPONENT HAVING ISOLATION STRUCTURE, AND SEMICONDUCTOR DEVICE" on Oct 30, 2024. With publication no. WO/2025/179928, the details related to the patent application was published on Sep 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual...