INTERNATIONAL PATENT: CORNING INCORPORATED FILES APPLICATION FOR "FLATNESS ERROR RESISTANT PHOTOMASK MEASUREMENT TECHNIQUES"

GENEVA, May 27 -- CORNING INCORPORATED (1 Riverfront PlazaCorning, New York 14831) filed a patent application (PCT/US2024/051487) for "FLATNESS ERROR RESISTANT PHOTOMASK MEASUREMENT TECHNIQUES" on Oct 16, 2024. With publication no. WO/2025/106202, the details related to the patent application was published on May 22, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): DUNN, Thomas James (61 Edenfield RoadPenfield, New York 14526), VAN KERKHOVE, Steven James (66 Lake RoadWebster, New York 14580)

Abstract: A method of determining a flatness of a substrate, the method including measuring a first...