INTERNATIONAL PATENT: CORNING INCORPORATED FILES APPLICATION FOR "ERROR RESISTANT PHOTOMASK MEASUREMENT TECHNIQUES FOR DIFFERENT SUPPORT POSITIONS"

GENEVA, May 27 -- CORNING INCORPORATED (1 Riverfront PlazaCorning, New York 14831) filed a patent application (PCT/US2024/051967) for "ERROR RESISTANT PHOTOMASK MEASUREMENT TECHNIQUES FOR DIFFERENT SUPPORT POSITIONS" on Oct 18, 2024. With publication no. WO/2025/106216, the details related to the patent application was published on May 22, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): DUNN, Thomas James (61 Edenfield RoadPenfield, New York 14526)

Abstract: A method of determining a flatness of a substrate, the method including measuring a first flatness measurement of the substrate at a...