INTERNATIONAL PATENT: CENTRAL GLASS COMPANY, LIMITED, セントラル硝子株式会社 FILES APPLICATION FOR "RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, ACID GENERATION AGENT, METHOD FOR PRODUCING COMPOUND, COMPOUND AND ACID GENERATION METHOD"

GENEVA, June 11 -- CENTRAL GLASS COMPANY, LIMITED (5253, Oaza Okiube, Ube-shi, Yamaguchi7550001), セントラル硝子株式会社 (山口県宇部市大字沖宇部５２５３番地) filed a patent application (PCT/JP2024/041628) for "RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, ACID GENERATION AGENT, METHOD FOR PRODUCING COMPOUND, COMPOUND, AND ACID GENERATION METHOD" on Nov 25, 2024. With publication no. WO/2025/115804, the details related to the patent application was published on Jun 05, 2025.

Notably, the patent application was submitt...