INTERNATIONAL PATENT: CENTRAL GLASS COMPANY, LIMITED, セントラル硝子株式会社 FILES APPLICATION FOR "ETCHING METHOD, PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE, ETCHING APPARATUS AND ETCHING GAS COMPOSITION"

GENEVA, Dec. 22 -- CENTRAL GLASS COMPANY, LIMITED (5253, Oaza Okiube, Ube-shi, Yamaguchi7550001), セントラル硝子株式会社 (山口県宇部市大字沖宇部５２５３番地) filed a patent application (PCT/JP2025/019285) for "ETCHING METHOD, PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE, ETCHING APPARATUS, AND ETCHING GAS COMPOSITION" on May 28, 2025. With publication no. WO/2025/258395, the details related to the patent application was published on Dec 18, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the Wo...