INTERNATIONAL PATENT: CENTRAL GLASS COMPANY, LIMITED, セントラル硝子株式会社 FILES APPLICATION FOR "ETCHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, ETCHING DEVICE, SURFACE TREATMENT GAS COMPOSITION AND ETCHING GAS COMPOSITION CONTAINING SURFACE TREATMENT MATERIAL"

GENEVA, April 15 -- CENTRAL GLASS COMPANY, LIMITED (5253, Oaza Okiube, Ube-shi, Yamaguchi7550001), セントラル硝子株式会社 (山口県宇部市大字沖宇部５２５３番地) filed a patent application (PCT/JP2024/034499) for "ETCHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, ETCHING DEVICE, SURFACE TREATMENT GAS COMPOSITION, AND ETCHING GAS COMPOSITION CONTAINING SURFACE TREATMENT MATERIAL" on Sep 26, 2024. With publication no. WO/2025/074942, the details related to the patent application was published on Apr 10, 2025.

Notably, the patent application was submitted under the In...