INTERNATIONAL PATENT: CENTRAL GLASS COMPANY, LIMITED, セントラル硝子株式会社 FILES APPLICATION FOR "DRY ETCHING METHOD, CLEANING METHOD, SEMICONDUCTOR DEVICE PRODUCTION METHOD AND ETCHING DEVICE"

GENEVA, Dec. 16 -- CENTRAL GLASS COMPANY, LIMITED (5253, Oaza Okiube, Ube-shi, Yamaguchi7550001), セントラル硝子株式会社 (山口県宇部市大字沖宇部５２５３番地) filed a patent application (PCT/JP2025/019699) for "DRY ETCHING METHOD, CLEANING METHOD, SEMICONDUCTOR DEVICE PRODUCTION METHOD, AND ETCHING DEVICE" on May 30, 2025. With publication no. WO/2025/254037, the details related to the patent application was published on Dec 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intelle...