INTERNATIONAL PATENT: CENTML AI INC. FILES APPLICATION FOR "SYSTEM AND METHOD FOR NON-INTRUSIVE PERFORMANCE ISOLATION FOR CONCURRENT DEEP LEARNING NETWORKS"

GENEVA, Jan. 25 -- CENTML AI INC. (2070-22 Adelaide St. W.Toronto, Ontario M5H 4E3) filed a patent application (PCT/CA2025/050979) for "SYSTEM AND METHOD FOR NON-INTRUSIVE PERFORMANCE ISOLATION FOR CONCURRENT DEEP LEARNING NETWORKS" on Jul 16, 2025. With publication no. WO/2026/015978, the details related to the patent application was published on Jan 22, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): ZHAO, Wei (c/o CentML AI Inc.; 2070-22 Adelaide St. W.M5H 4E3, Ontario M5H 4E3), JAYARAJAN, Anand (c/o CentML AI Inc.; 2070-22 Adelaide St. W.Toronto, Ontario M5H 4E3), PEKHIMENKO, Gennady (c/...