INTERNATIONAL PATENT: CENTML AI INC. FILES APPLICATION FOR "SYSTEM AND METHOD FOR FINE TUNING LARGE LANGUAGE MODELS (LLMS) USING SPARSE EMBEDDED ADAPTERS VIA HIERARCHICAL APPROXIMATE SECOND-ORDER INFORMATION"

GENEVA, Dec. 15 -- CENTML AI INC. (2070-22 Adelaide St. W.Toronto, Ontario M5H 4E3) filed a patent application (PCT/CA2025/050718) for "SYSTEM AND METHOD FOR FINE TUNING LARGE LANGUAGE MODELS (LLMS) USING SPARSE EMBEDDED ADAPTERS VIA HIERARCHICAL APPROXIMATE SECOND-ORDER INFORMATION" on May 16, 2025. With publication no. WO/2025/251143, the details related to the patent application was published on Dec 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MU, Baorun (c/o CentML Inc.; 2070-22 Adelaide St. W.Toronto, Ontario M5H 4E3), GIANNOULA, Christina (c/o CentML Inc.; 2070-22 Adelaide St. W...