GENEVA, May 11 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2024/078216) for "PROJECTION SYSTEM WITH MINIMISED THERMALLY INDUCED, OSCILLATING ABERRATIONS" on Oct 08, 2024. With publication no. WO/2025/093229, the details related to the patent application was published on May 08, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): RONELLENFITSCH, Henrik (Rudolf-Eber-Strasse 273447 Oberkochen)
Abstract:
The present invention relates to a projection system for a projection exposure apparatus for micro-lithography, in particular for EUV lithogra...