INTERNATIONAL PATENT: CARL ZEISS SMT GMBH FILES APPLICATION FOR "PROJECTION EXPOSURE METHOD, PROJECTION LENS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS"

GENEVA, Nov. 3 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Str. 273447 Oberkochen) filed a patent application (PCT/EP2025/056765) for "PROJECTION EXPOSURE METHOD, PROJECTION LENS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS" on Mar 12, 2025. With publication no. WO/2025/223738, the details related to the patent application was published on Oct 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): EPPLE, Alexander (Carl-Zeiss-Strasse 2273447 Oberkochen)

Abstract: In a projection exposure method for exposing a substrate arranged in the region of an image plane of a projection lens with at least ...