GENEVA, Dec. 22 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2025/066211) for "OPTOMECHANICAL SYSTEM FOR PROJECTION LITHOGRAPHY" on Jun 11, 2025. With publication no. WO/2025/257238, the details related to the patent application was published on Dec 18, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): FREIMANN, Rolf (Rudolf-Eber-Strasse 273447 Oberkochen)
Abstract: An optomechanical system (24) for projection lithography has an object holder (7a) having an object displacement drive (7b) for moving an object (7) to be illuminated through an ...