GENEVA, Feb. 16 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2024/069582) for "OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM" on Jul 11, 2024. With publication no. WO/2025/031712, the details related to the patent application was published on Feb 13, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): KRUIS, Johannes (Rudolf-Eber-Strasse 273447 Oberkochen), DOETZEL, Eugen (Rudolf-Eber-Strasse 273447 Oberkochen)
Abstract:
The invention relates to an optical system (200) for a projection exposure system (1A, 1B), having an optical assembly (10...