GENEVA, May 5 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2024/077431) for "OPTICAL ELEMENT AND EUV LITHOGRAPHY SYSTEM" on Sep 30, 2024. With publication no. WO/2025/087653, the details related to the patent application was published on May 01, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): HUBER, Peter (Rudolf-Eber-Strasse 273447 Oberkochen)
Abstract:
The invention relates to an optical element (25) for reflecting EUV radiation (16), comprising: a substrate (26), a reflective coating (27) for reflecting the EUV radiation (16), and an ...