GENEVA, April 19 -- CARL ZEISS SMT GMBH (Rudolf-Eber-StraBe 273447 Oberkochen) filed a patent application (PCT/EP2024/078277) for "MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM" on Oct 08, 2024. With publication no. WO/2025/078370, the details related to the patent application was published on Apr 17, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): VOELTER, Alexander (c/o Carl Zeiss SMT GmbHRudolf-Eber-StraBe 273447 Oberkochen), WOLFSTEINER, Thomas (c/o Carl Zeiss SMT GmbHRudolf-Eber-StraBe 273447 Oberkochen)
Abstract:
The invention relates to a microlithographic projection exposure system...