GENEVA, Nov. 3 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Str. 273447 Oberkochen) filed a patent application (PCT/EP2025/056695) for "MICROLITHOGRAPHIC PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS" on Mar 12, 2025. With publication no. WO/2025/223736, the details related to the patent application was published on Oct 30, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): EMER, Wolfgang (Rudolf-Eber-Strasse 273447 Oberkochen), EPPLE, Alexander (Carl-Zeiss-Strasse 2273447 Oberkochen)
Abstract: In a projection exposure method for exposing a substrate arranged in the region of an image pl...