GENEVA, Sept. 29 -- CARL ZEISS SMT GMBH (Rudolf-Eber-StraBe 273447 Oberkochen) filed a patent application (PCT/EP2025/053935) for "METHOD FOR OPERATING AN EUV MIRROR SYSTEM, EUV MIRROR SYSTEM, AND MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION" on Feb 13, 2025. With publication no. WO/2025/195691, the details related to the patent application was published on Sep 25, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SEITZ, Daniel (c/o CARL ZEISS SMT GMBHRudolf-Eber-StraBe 273447 Oberkochen), OELTZE, Martin (c/o CARL ZEISS SMT GMBHRudolf-Eber-StraBe 273447 Oberkochen), SPANNAGEL, Ruven (c/o...