INTERNATIONAL PATENT: CARL ZEISS SMT GMBH FILES APPLICATION FOR "METHOD FOR HIGHLY ACCURATELY DETERMINING THE LOCATION OF A STRUCTURE, APPARATUS FOR CARRYING OUT THE METHOD AND METROLOGY SYSTEM FOR MEASURING LITHOGRAPHY MASKS"

GENEVA, Nov. 3 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2025/061243) for "METHOD FOR HIGHLY ACCURATELY DETERMINING THE LOCATION OF A STRUCTURE, APPARATUS FOR CARRYING OUT THE METHOD AND METROLOGY SYSTEM FOR MEASURING LITHOGRAPHY MASKS" on Apr 24, 2025. With publication no. WO/2025/224253, the details related to the patent application was published on Oct 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): DORING, Dirk (Carl-Zeiss-Promenade 1007745 Jena), SCHMIDT, Soren (Carl-Zeiss-Promenade 1007745 Jena)

Abstract: To determine the posi...