GENEVA, Oct. 18 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2025/057978) for "METHOD FOR ANALYSING AND/OR PROCESSING A LITHOGRAPHY MASK AND REPAIR SYSTEM" on Mar 24, 2025. With publication no. WO/2025/214749, the details related to the patent application was published on Oct 16, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): RHINOW, Daniel (Industriestr. 164380 RoBdorf), BUDACH, Michael (Industriestr. 164380 RoBdorf), TU, Fan (Industriestr. 164380 RoBdorf)
Abstract: Method for analysing and/or processing a lithography mask (100) for a li...