GENEVA, Jan. 5 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2025/067461) for "METHOD AND SYSTEM FOR EVALUATING THE QUALITY OF A PHOTOLITHOGRAPHY MASK" on Jun 22, 2025. With publication no. WO/2026/002829, the details related to the patent application was published on Jan 02, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): VAN DRIEL, Martin (Carl-Zeiss-Promenade 107745 Jena), GEORG, Niklas (Carl-Zeiss-Promenade 107745 Jena)
Abstract: The invention relates to a method for emulating an aerial image (40) of a photolithography mask obtained by ...