GENEVA, March 9 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2024/067119) for "LITHOGRAPHY SYSTEM COMPRISING A MEASUREMENT DEVICE" on Jun 19, 2024. With publication no. WO/2025/045406, the details related to the patent application was published on Mar 06, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): STOLZ, Michael (Rudolf-Eber-Strasse 273447 Oberkochen), LAUFER, Timo (Rudolf-Eber-Strasse 273447 Oberkochen)
Abstract:
The invention relates to a lithography system, in particular an EUV lithography system, said lithography system comprisi...