GENEVA, July 1 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2024/086222) for "LASER LIGHT SOURCE, IN PARTICULAR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEM" on Dec 13, 2024. With publication no. WO/2025/132082, the details related to the patent application was published on Jun 26, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): LUNDT, Nils (Rudolf-Eber-Strasse 273447 Oberkochen), MOSER, Barbara (Carl-Zeiss-Strasse 2273447 Oberkochen), HERMANN, Martin (Carl-Zeiss-Strasse 2273447 Oberkochen), WOLKE, Conrad (Rudolf-Eber-Strasse 27...