GENEVA, May 11 -- CARL ZEISS SMT GMBH (Rudolf-Eber-StraBe 273447 Oberkochen) filed a patent application (PCT/EP2024/075857) for "EUV MIRROR SYSTEM, METHOD FOR OPERATING AN EUV MIRROR SYSTEM, PROJECTION LENS FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS" on Sep 17, 2024. With publication no. WO/2025/093185, the details related to the patent application was published on May 08, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): KOHLER, Wilbert (c/o Carl Zeiss SMT GmbHRudolf-Eber-StraBe 273447 Oberkochen), BECKER, Moritz (c/o Carl Zeiss SMT GmbHRudolf-Eber-StraBe 2Oberkochen 73447)
Abstra...