GENEVA, May 12 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2024/079792) for "ADAPTIVE OPTICAL MODULE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM" on Oct 22, 2024. With publication no. WO/2025/093373, the details related to the patent application was published on May 08, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): GRUNER, Toralf (Rudolf-Eber-Strasse 273447 Oberkochen), RAAB, Markus (Rudolf-Eber-Strasse 273447 Oberkochen), STIEPAN, Hans Michael (Rudolf-Eber-Strasse 273447 Oberkochen), WITT, Axel (Rudolf-Eber-Strasse 273447 Oberkoc...