INTERNATIONAL PATENT: BOSTIK SA FILES APPLICATION FOR "PHOTOCURABLE COMPOSITION COMPRISING N-HEPTYLCYANOACRYLATE, N-HEXYLCYANOACRYLATE OR N-OCTYLCYANOACRYLATE"

GENEVA, June 16 -- BOSTIK SA (51 Esplanade du General de GaulleLa Defense92800 Puteaux) filed a patent application (PCT/EP2024/084397) for "PHOTOCURABLE COMPOSITION COMPRISING N-HEPTYLCYANOACRYLATE, N-HEXYLCYANOACRYLATE OR N-OCTYLCYANOACRYLATE" on Dec 03, 2024. With publication no. WO/2025/119863, the details related to the patent application was published on Jun 12, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): GARRA, Patxi (AFINITICA TECHNOLOGIES SLEDIFICI EUREKACAMPUS UAB08193 BELLATERRA, BARCELONA), FAGGI, Enrico (AFINITICA TECHNOLOGIES SLEDIFICI EUREKACAMPUS UAB08193 BELLATERRA, BARCE...