INTERNATIONAL PATENT: BIONTECH SE, ROTHENBERG, DANIEL ABRAM, ROSCOE, BENJAMIN P. FILES APPLICATION FOR "RNA CONSTRUCTS WITH N-TERMINAL DEGRONS TO ENHANCE AN IMMUNE RESPONSE"

GENEVA, April 2 -- BIONTECH SE (An der Goldgrube 1255131 Mainz), ROTHENBERG, Daniel Abram (c/o BioNTech US Inc.40 Erie Street, Suite 110Cambridge, Massachusetts 02139), ROSCOE, Benjamin P. (c/o BioNTech US Inc.40 Erie Street, Suite 110Cambridge, Massachusetts 02139) filed a patent application (PCT/US2024/047736) for "RNA CONSTRUCTS WITH N-TERMINAL DEGRONS TO ENHANCE AN IMMUNE RESPONSE" on Sep 20, 2024. With publication no. WO/2025/064850, the details related to the patent application was published on Mar 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BIONTECH SE (An der Goldgrube 125513...