GENEVA, Aug. 4 -- BENEQ OY (Olarinluoma 902200 Espoo) filed a patent application (PCT/FI2025/050027) for "PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS" on Jan 21, 2025. With publication no. WO/2025/158105, the details related to the patent application was published on Jul 31, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): ZHU, Zhen (Beneq OyOlarinluoma 902200 Espoo), BROWN, Paul (Beneq OyOlarinluoma 902200 Espoo)
Abstract:
The invention relates to a plasma-enhanced atomic layer deposition apparatus comprising a vacuum chamber (1), a reaction chamber (2) arranged inside the vacuum ch...