GENEVA, June 23 -- BENEQ OY (Olarinluoma 902200 Espoo) filed a patent application (PCT/FI2024/050687) for "AN APPARATUS" on Dec 13, 2024. With publication no. WO/2025/125727, the details related to the patent application was published on Jun 19, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): ANDERSSON, Jonas (Beneq OyOlarinluoma 902200 Espoo)
Abstract:
The invention relates to an apparatus for subjecting a surface (100a) of a substrate (100) to successive surface reactions of at least a first precursor and a second precursor according to the principles of atomic layer deposition. The app...