INTERNATIONAL PATENT: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., 北京北方华创微电子装备有限公司 FILES APPLICATION FOR "ETCHING METHOD FOR SC-CONTAINING LAYER, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR AND PROCESS DEVICE"

Posted On: 2025-05-17

GENEVA, May 17 -- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. (NO.8 Wenchang Avenue, Beijing Economic-Technological Development Area,Daxing District, Beijing 100176), 北京北方华创微电子装备有限公司 (中国北京市大兴区北京经济技术开发区文昌大道8号) filed a patent application (PCT/CN2024/126331) for "ETCHING METHOD FOR SC-CONTAINING LAYER, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR, AND PROCESS DEVICE" on Oct 22, 2024. With publication no. WO/2025/098131, the details related to the patent application was pub...

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INTERNATIONAL PATENT: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., 北京北方华创微电子装备有限公司 FILES APPLICATION FOR "ETCHING METHOD FOR SC-CONTAINING LAYER, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR AND PROCESS DEVICE"