INTERNATIONAL PATENT: BASF SE FILES APPLICATION FOR "USE OF A COMPOSITION AND A PROCESS FOR SELECTIVELY ETCHING SILICON"

GENEVA, Oct. 4 -- BASF SE (Carl-Bosch-Strasse 3867056 Ludwigshafen am Rhein) filed a patent application (PCT/EP2025/057598) for "USE OF A COMPOSITION AND A PROCESS FOR SELECTIVELY ETCHING SILICON" on Mar 20, 2025. With publication no. WO/2025/202010, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LOPEZ VILLANUEVA, Francisco Javier (Carl-Bosch-StraBe 3867056 Ludwigshafen am Rhein), MARX, Maximilian (Carl-Bosch-StraBe 3867056 Ludwigshafen am Rhein), KLIPP, Andreas (Carl-Bosch-StraBe 3867056 Ludwigshafen am Rhein)

Abstract...