GENEVA, Oct. 27 -- BASF SE (Carl-Bosch-Strasse 3867056 Ludwigshafen am Rhein) filed a patent application (PCT/EP2025/060104) for "SOLUTION FOR POST ETCH RESIDUE REMOVAL (PERR)" on Apr 11, 2025. With publication no. WO/2025/219277, the details related to the patent application was published on Oct 23, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): GUEVENC, Haci Osman (Carl-Bosch-StraBe 3867056 Ludwigshafen am Rhein), KLIPP, Andreas (Carl-Bosch-StraBe 3867056 Ludwigshafen am Rhein)
Abstract: The present invention relates to a concentrate for preparing a composition for removing post etch res...