INTERNATIONAL PATENT: BASF SE FILES APPLICATION FOR "COMPOSITION, ITS USE AND A PROCESS FOR SELECTIVELY ETCHING SILICON-GERMANIUM LAYERS"

GENEVA, Feb. 2 -- BASF SE (Carl-Bosch-Strasse 3867056 Ludwigshafen am Rhein) filed a patent application (PCT/EP2025/070634) for "COMPOSITION, ITS USE AND A PROCESS FOR SELECTIVELY ETCHING SILICON-GERMANIUM LAYERS" on Jul 18, 2025. With publication no. WO/2026/022021, the details related to the patent application was published on Jan 29, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LOPEZ VILLANUEVA, Francisco Javier (Carl-Bosch-StraBe 3867056 Ludwigshafen am Rhein), MARX, Maximilian (Carl-Bosch-StraBe 3867056 Ludwigshafen am Rhein), LO, Chih Hui (No. 31, Jingjian 2nd RoadTaoyuan City, 3285...