INTERNATIONAL PATENT: AXCELIS TECHNOLOGIES, INC. FILES APPLICATION FOR "IMPROVED ENERGY ACCURACY FOR AN RF LINEAR ACCELERATOR ION IMPLANTATION SYSTEM"

GENEVA, Nov. 11 -- AXCELIS TECHNOLOGIES, INC. (108 Cherry Hill DriveBeverly, Massachusetts 01915) filed a patent application (PCT/US2025/027012) for "IMPROVED ENERGY ACCURACY FOR AN RF LINEAR ACCELERATOR ION IMPLANTATION SYSTEM" on Apr 30, 2025. With publication no. WO/2025/231087, the details related to the patent application was published on Nov 06, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SATOH, Shu (11 Larkin RoadByfield, Massachusetts 01922)

Abstract: An ion implantation system (100) has an ion source (102) configured to form an ion beam (108) along a beam path (140). An acceler...