GENEVA, May 28 -- AXCELIS TECHNOLOGIES, INC. (108 Cherry Hill DriveBeverly, Massachusetts 01915) filed a patent application (PCT/US2024/056423) for "HIGH BANDWIDTH VARIABLE DOSE ION IMPLANTATION SYSTEM AND METHOD" on Nov 18, 2024. With publication no. WO/2025/106994, the details related to the patent application was published on May 22, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): RAY, Andy (155 Northern BoulevardNewburyport, Massachusetts 01950)
Abstract:
An ion implantation system 100 includes an ion source 108 that generates ions and produces an ion beam 112 along a beamline 160, op...