INTERNATIONAL PATENT: ATOTECH DEUTSCHLAND GMBH & CO. KG FILES APPLICATION FOR "AN AQUEOUS BASIC DEPOSITION COMPOSITION FOR THE ELECTROLESS DEPOSITION OF A METAL ON A SURFACE OF A SUBSTRATE"

GENEVA, May 17 -- ATOTECH DEUTSCHLAND GMBH & CO. KG (ErasmusstraBe 2010553 Berlin) filed a patent application (PCT/EP2024/080814) for "AN AQUEOUS BASIC DEPOSITION COMPOSITION FOR THE ELECTROLESS DEPOSITION OF A METAL ON A SURFACE OF A SUBSTRATE" on Oct 31, 2024. With publication no. WO/2025/098869, the details related to the patent application was published on May 15, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KOHLMANN, Lars (c/o Atotech Deutschland GmbH & Co. KGIntellectual PropertyErasmusstraBe 2010553 Berlin), BRUNNER, Heiko (c/o Atotech Deutschland GmbH & Co. KGPatent ManagementEras...