GENEVA, July 21 -- ATLANT 3D, APS (Markaervej 2BDK-2630 Taastrup), THE IP LAW FIRM OF GUY LEVI, LLC (820 Albemarle St.Wyckoff, NJ 07481) filed a patent application (PCT/US2025/011322) for "METHOD FOR FABRICATION OF FINE-FEATURED ETCH MASK USING DIRECT ATOMIC LAYER PROCESSING" on Jan 12, 2025. With publication no. WO/2025/151845, the details related to the patent application was published on Jul 17, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): PARFENIUKAS, Karolis (Tomsggardvej 93 St TvHoje-Taastrup2400 Kobenhaven), KUNDRATA, Ivan (Hlavna 543/17192241 Drahvoce)
Abstract:
The disclosure ...