INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "UNIFORMITY CORRECTION MODULE AND CORRESPONDING METHOD OF VARYING LOCAL ANGULAR DISTRIBUTION OF RADIATION USING A UNIFORMITY CORRECTION MODULE"

GENEVA, Nov. 24 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/060587) for "UNIFORMITY CORRECTION MODULE AND CORRESPONDING METHOD OF VARYING LOCAL ANGULAR DISTRIBUTION OF RADIATION USING A UNIFORMITY CORRECTION MODULE" on Apr 16, 2025. With publication no. WO/2025/237622, the details related to the patent application was published on Nov 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VAN GORKOM, Ramon, Pascal (P.O. Box 3245500 AH Veldhoven)

Abstract: There is provided an illumination uniformity correction apparatus for use in an illumina...