GENEVA, June 16 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/083674) for "SYSTEMS AND METHODS OF PARTICLE CONTAMINATION REDUCTION IN CHARGED-PARTICLE BEAM SYSTEMS" on Nov 26, 2024. With publication no. WO/2025/119714, the details related to the patent application was published on Jun 12, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): HUANG, Zhuangxiong (P.O. Box 3245500 AH Veldhoven), YU, Dongchi (80 W Tasman DriveSan Jose, California 95134)
Abstract:
Systems and methods of increasing gas flow across a substrate in a charged-particle bea...