INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SYSTEMS AND METHODS FOR RETICLE TRANSMISSION MEASUREMENTS IN A LITHOGRAPHIC SYSTEM"

GENEVA, Jan. 12 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/065527) for "SYSTEMS AND METHODS FOR RETICLE TRANSMISSION MEASUREMENTS IN A LITHOGRAPHIC SYSTEM" on Jun 04, 2025. With publication no. WO/2026/008237, the details related to the patent application was published on Jan 08, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SUBRAMANIAN, Raaja Ganapathy (P.O. Box 3245500 AH Veldhoven), TE PAS, Sjoerd, Theodorus, Franciscus (P.O. Box 3245500 AH Veldhoven)

Abstract: A system includes a light source, a sensor, and a controller. The light s...