INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SYSTEMS AND METHODS FOR OVERLAY MEASUREMENT"

GENEVA, Nov. 24 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/060954) for "SYSTEMS AND METHODS FOR OVERLAY MEASUREMENT" on Apr 22, 2025. With publication no. WO/2025/237633, the details related to the patent application was published on Nov 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): ZHANG, Chenyu (80 W Tasman Dr.San Jose, California 95134), FU, Jiyou (80 W Tasman Dr.San Jose, California 95134)

Abstract: Systems and methods for determining overlay of layers in a sample. Systems and methods include determining line profiles based on s...