INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SYSTEMS AND METHODS FOR OPTICAL PROXIMITY CORRECTION (OPC) MODEL CALIBRATION IN A STITCHING REGION"

GENEVA, Feb. 8 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/068103) for "SYSTEMS AND METHODS FOR OPTICAL PROXIMITY CORRECTION (OPC) MODEL CALIBRATION IN A STITCHING REGION" on Jun 26, 2025. With publication no. WO/2026/027141, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): PANDEY, Nitesh (80 W Tasman DriveSan Jose, California 95134), HUNSCHE, Stefan (80 W Tasman DriveSan Jose, California 95134), NAM, Dong Seok (80 W Tasman DriveSan Jose, California 95134), LYONS, Adam (8...