INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SYSTEMS AND METHODS FOR NON-LINEAR OPTICAL METROLOGY FOR ADVANCED SUB-DIFFRACTION IMAGING"

GENEVA, Feb. 3 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2024/068789) for "SYSTEMS AND METHODS FOR NON-LINEAR OPTICAL METROLOGY FOR ADVANCED SUB-DIFFRACTION IMAGING" on Jul 03, 2024. With publication no. WO/2025/021452, the details related to the patent application was published on Jan 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): EDWARD, Stephen (P.O. Box 3245500 AH Veldhoven), SETIJA, Irwan, Dani (P.O. Box 3245500 AH Veldhoven), DEN BOEF, Arie, Jeffrey (P.O. Box 3245500 AH Veldhoven)

Abstract: A sensor apparatus can include a transi...