GENEVA, Aug. 10 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/050167) for "SYSTEMS AND METHODS FOR GUIDED TEMPLATE MATCHING IN METROLOGY SYSTEMS" on Jan 06, 2025. With publication no. WO/2025/162676, the details related to the patent application was published on Aug 07, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): FU, Jiyou (80 W Tasman Dr.San Jose, California 95134), ZHANG, Chenyu (80 W Tasman Dr.San Jose, California 95134)

Abstract: Systems and methods for guided template matching may include generating an image of a sample; per unit ...